Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC: Fid-Bau Portal

Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC

Zhang, F. / Zhu, H. / Yang, W. / Wu, Z. / Qi, H. / He, H. / Fan, Z. / Shao, J.

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Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC

Zhang, F. / Zhu, H. / Yang, W. / Wu, Z. / Qi, H. / He, H. / Fan, Z. / Shao, J.

Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC

Zhang, F. / Zhu, H. / Yang, W. / Wu, Z. / Qi, H. / He, H. / Fan, Z. / Shao, J.

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Title:

Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC

Contributors:

Zhang, F. (author) / Zhu, H. (author) / Yang, W. (author) / Wu, Z. (author) / Qi, H. (author) / He, H. (author) / Fan, Z. (author) / Shao, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 254 ; 3045-3048

Publication date:

2008-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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