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    Structural properties and electrical resistivity of TiNx and Ti~1~-~xAl~xN films prepared by reactive dc magnetron sputtering: effect of nitrogen flowrate

    New search for: Irudayaraj, A.A.
    New search for: Kuppusami, P.
    New search for: Kalainathan, S.

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    Structural properties and electrical resistivity of TiNx and Ti~1~-~xAl~xN films prepared by reactive dc magnetron sputtering: effect of nitrogen flowrate

    New search for: Irudayaraj, A.A.
    New search for: Kuppusami, P.
    New search for: Kalainathan, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural properties and electrical resistivity of TiNx and Ti~1~-~xAl~xN films prepared by reactive dc magnetron sputtering: effect of nitrogen flowrate

    New search for: Irudayaraj, A.A.
    New search for: Kuppusami, P.
    New search for: Kalainathan, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Structural properties and electrical resistivity of TiNx and Ti~1~-~xAl~xN films prepared by reactive dc magnetron sputtering: effect of nitrogen flowrate

    Contributors:

    Irudayaraj, A.A. (author) / Kuppusami, P. (author) / Kalainathan, S. (author)

    Published in:

    SURFACE ENGINEERING -LONDON- ; 24 ; 28-35

    Publication date:

    2008-01-01

    Size:

    8 pages

    ISSN:

    0267-0844

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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