In situ chemical vapour co-deposition of Al and Si to form diffusion coatings on TZM: Fid-Bau Portal

In situ chemical vapour co-deposition of Al and Si to form diffusion coatings on TZM

Majumdar, S. / Sharma, I. G. / Raveendra, S. / Samajdar, I. / Bhargava, P.

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In situ chemical vapour co-deposition of Al and Si to form diffusion coatings on TZM

Majumdar, S. / Sharma, I. G. / Raveendra, S. / Samajdar, I. / Bhargava, P.

In situ chemical vapour co-deposition of Al and Si to form diffusion coatings on TZM

Majumdar, S. / Sharma, I. G. / Raveendra, S. / Samajdar, I. / Bhargava, P.

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Check availability in my library

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Document information

Title:

In situ chemical vapour co-deposition of Al and Si to form diffusion coatings on TZM

Contributors:

Majumdar, S. (author) / Sharma, I. G. (author) / Raveendra, S. (author) / Samajdar, I. (author) / Bhargava, P. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING A ; 492 ; 211-217

Publication date:

2008-01-01

Size:

7 pages

ISSN:

0921-5093

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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