A platform for research: civil engineering, architecture and urbanism
Wet cleaning and surface characterization of Si1-xGex virtual substrates after a CMP step
Wet cleaning and surface characterization of Si1-xGex virtual substrates after a CMP step
Wet cleaning and surface characterization of Si1-xGex virtual substrates after a CMP step
Abbadie, A. (author) / Hartmann, J. M. (author) / Besson, P. (author) / Rouchon, D. (author) / Martinez, E. (author) / Holliger, P. (author) / Di Nardo, C. (author) / Campidelli, Y. (author) / Billon, T. (author)
APPLIED SURFACE SCIENCE ; 254 ; 6793-6798
2008-01-01
6 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2000
|Si1−xGex bulk single crystals for substrates of electronic devices
British Library Online Contents | 2017
|Room temperature oxidation of Cu3Ge and Cu3(Si1-xGex) on Si1-xGex
British Library Online Contents | 2001
|Raman spectroscopy of Si1-xGex epilayers
British Library Online Contents | 2005
|Ripple morphologies on ion irradiated Si1-xGex
British Library Online Contents | 2008
|