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Boron out-diffusion mechanism in oxide and nitride CMOS sidewall spacer: Impact of the materials properties
Boron out-diffusion mechanism in oxide and nitride CMOS sidewall spacer: Impact of the materials properties
Boron out-diffusion mechanism in oxide and nitride CMOS sidewall spacer: Impact of the materials properties
Pelletier, B. (author) / Juhel, M. (author) / Trouiller, C. (author) / Beucher, D. (author) / Autran, J. L. (author) / Morin, P. (author)
MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 154-155 ; 252-255
2008-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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