Impurity Contamination and Diffusion during Annealing in Implanted ZnO: Fid-Bau Portal

Impurity Contamination and Diffusion during Annealing in Implanted ZnO

Sakaguchi, I. / Adachi, Y. / Ogaki, T. / Matsumoto, K. / Hishita, S. / Haneda, H. / Ohashi, N.

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Impurity Contamination and Diffusion during Annealing in Implanted ZnO

Sakaguchi, I. / Adachi, Y. / Ogaki, T. / Matsumoto, K. / Hishita, S. / Haneda, H. / Ohashi, N.

Impurity Contamination and Diffusion during Annealing in Implanted ZnO

Sakaguchi, I. / Adachi, Y. / Ogaki, T. / Matsumoto, K. / Hishita, S. / Haneda, H. / Ohashi, N.

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Document information

Title:

Impurity Contamination and Diffusion during Annealing in Implanted ZnO

Contributors:

Sakaguchi, I. (author) / Adachi, Y. (author) / Ogaki, T. (author) / Matsumoto, K. (author) / Hishita, S. (author) / Haneda, H. (author) / Ohashi, N. (author)

Published in:

KEY ENGINEERING MATERIALS ; 388 ; 23-26

Publication date:

2009-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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