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Oxygen-Partial-Pressure Dependence of SiC Oxidation Rate Studied by In Situ Spectroscopic Ellipsometry
Oxygen-Partial-Pressure Dependence of SiC Oxidation Rate Studied by In Situ Spectroscopic Ellipsometry
Oxygen-Partial-Pressure Dependence of SiC Oxidation Rate Studied by In Situ Spectroscopic Ellipsometry
Yamamoto, T. (author) / Hijikata, Y. (author) / Yaguchi, H. (author) / Yoshida, S. (author)
MATERIALS SCIENCE FORUM ; 600/603 ; 667-670
2009-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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