Effect of filament biasing on nanocrystalline-Si films deposited by hot wire chemical vapor deposition: Fid-Bau Portal

Effect of filament biasing on nanocrystalline-Si films deposited by hot wire chemical vapor deposition

Swain, B. P. / Swain, B. S. / Yang, S. M. / Hwang, N. M.

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Effect of filament biasing on nanocrystalline-Si films deposited by hot wire chemical vapor deposition

Swain, B. P. / Swain, B. S. / Yang, S. M. / Hwang, N. M.

Effect of filament biasing on nanocrystalline-Si films deposited by hot wire chemical vapor deposition

Swain, B. P. / Swain, B. S. / Yang, S. M. / Hwang, N. M.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effect of filament biasing on nanocrystalline-Si films deposited by hot wire chemical vapor deposition

Contributors:

Swain, B. P. (author) / Swain, B. S. (author) / Yang, S. M. (author) / Hwang, N. M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 6033-6037

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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