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IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM
IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM
IP-Dip photoresist surfaces for photonic applications prepared by laser lithography and studied by AFM
Durisova, Jana (author) / Pudis, Dusan (author) / Goraus, Matej (author) / Gaso, Peter (author)
Applied surface science ; 461 ; 108-112
2018-01-01
5 pages
Article (Journal)
English
DDC:
620.44
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