A platform for research: civil engineering, architecture and urbanism
Characterization of SiOF Thin Films Deposited by PECVD from Hexamethyldisiloxane in Mixture with Oxygen and CF~4
Characterization of SiOF Thin Films Deposited by PECVD from Hexamethyldisiloxane in Mixture with Oxygen and CF~4
Characterization of SiOF Thin Films Deposited by PECVD from Hexamethyldisiloxane in Mixture with Oxygen and CF~4
Chabane, R. (author) / Sahli, S. (author) / Zenasni, A. (author) / Raynaud, P. (author) / Segui, Y. (author) / Gabouze, N.
2009-01-01
4 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2009
|Ion-beam-induced biomedical behavior of hexamethyldisiloxane films on deposited polyetherurethanes
British Library Online Contents | 1998
|Characterization of a-C:H Thin Films Deposited from C~2H~4 by PECVD Microwave Discharge
British Library Online Contents | 2009
|Optical properties of boron nitride thin films deposited by microwave PECVD
British Library Online Contents | 2001
|