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    Water Molecule Sensitive Layers Deposited from Hexamethyldisiloxane/Oxygen Mixture at Low Temperature

    New search for: Guermat, N.
    New search for: Bellel, A.
    New search for: Sahli, S.
    New search for: Segui, Y.
    New search for: Raynaud, P.
    New search for: Gabouze, N.

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    Water Molecule Sensitive Layers Deposited from Hexamethyldisiloxane/Oxygen Mixture at Low Temperature

    New search for: Guermat, N.
    New search for: Bellel, A.
    New search for: Sahli, S.
    New search for: Segui, Y.
    New search for: Raynaud, P.
    New search for: Gabouze, N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Water Molecule Sensitive Layers Deposited from Hexamethyldisiloxane/Oxygen Mixture at Low Temperature

    New search for: Guermat, N.
    New search for: Bellel, A.
    New search for: Sahli, S.
    New search for: Segui, Y.
    New search for: Raynaud, P.
    New search for: Gabouze, N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Water Molecule Sensitive Layers Deposited from Hexamethyldisiloxane/Oxygen Mixture at Low Temperature

    Contributors:

    Guermat, N. (author) / Bellel, A. (author) / Sahli, S. (author) / Segui, Y. (author) / Raynaud, P. (author) / Gabouze, N.

    Published in:

    Thin Films and Porous Materials ; 69-74

    MATERIALS SCIENCE FORUM ; 609

    Publication date:

    2009-01-01

    Size:

    6 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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