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Characterization of SiOF Thin Films Deposited by PECVD from Hexamethyldisiloxane in Mixture with Oxygen and CF~4
Characterization of SiOF Thin Films Deposited by PECVD from Hexamethyldisiloxane in Mixture with Oxygen and CF~4
Characterization of SiOF Thin Films Deposited by PECVD from Hexamethyldisiloxane in Mixture with Oxygen and CF~4
Chabane, R. (Autor:in) / Sahli, S. (Autor:in) / Zenasni, A. (Autor:in) / Raynaud, P. (Autor:in) / Segui, Y. (Autor:in) / Gabouze, N.
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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