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An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/oxygen plasmas
An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/oxygen plasmas
An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/oxygen plasmas
Alexander, M. R. (author) / Short, R. D. (author) / Jones, F. R. (author) / Stollenwerk, M. (author) / Zabold, J. (author) / Michaeli, W. (author)
JOURNAL OF MATERIALS SCIENCE ; 31 ; 1879-1885
1996-01-01
7 pages
Article (Journal)
English
DDC:
620.11
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