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Quantitative study of the Si/SiO2 phase separation in substoichiometric silicon oxide films

Nicotra, G. / Spinella, C. / La Magna, A. / Bongiorno, C. / Rimini, E.

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Quantitative study of the Si/SiO2 phase separation in substoichiometric silicon oxide films

Nicotra, G. / Spinella, C. / La Magna, A. / Bongiorno, C. / Rimini, E.

Quantitative study of the Si/SiO2 phase separation in substoichiometric silicon oxide films

Nicotra, G. / Spinella, C. / La Magna, A. / Bongiorno, C. / Rimini, E.

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Document information

Title:

Quantitative study of the Si/SiO2 phase separation in substoichiometric silicon oxide films

Contributors:

Nicotra, G. (author) / Spinella, C. (author) / La Magna, A. (author) / Bongiorno, C. (author) / Rimini, E. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 159-160 ; 80-82

Publication date:

2009-01-01

Size:

3 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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