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Effect of N content on phase configuration, nanostructure and mechanical behaviors in Ti-Cx-Ny thin films
Effect of N content on phase configuration, nanostructure and mechanical behaviors in Ti-Cx-Ny thin films
Effect of N content on phase configuration, nanostructure and mechanical behaviors in Ti-Cx-Ny thin films
Lu, Y. H. (author) / Wang, J. P. (author) / Shen, Y. G. (author)
APPLIED SURFACE SCIENCE ; 255 ; 7858-7863
2009-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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