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Effect of N content on phase configuration, nanostructure and mechanical behaviors in Ti-Cx-Ny thin films
Effect of N content on phase configuration, nanostructure and mechanical behaviors in Ti-Cx-Ny thin films
Effect of N content on phase configuration, nanostructure and mechanical behaviors in Ti-Cx-Ny thin films
Lu, Y. H. (Autor:in) / Wang, J. P. (Autor:in) / Shen, Y. G. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 7858-7863
01.01.2009
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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