Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering: Fid-Bau Portal

Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering

Li, Z. G. / Miyake, S.

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Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering

Li, Z. G. / Miyake, S.

Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering

Li, Z. G. / Miyake, S.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering

Contributors:

Li, Z. G. (author) / Miyake, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 9149-9153

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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