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Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Bang, J. / Jeong, U. / Ryu, D. Y. / Russell, T. P. / Hawker, C. J.

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Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Bang, J. / Jeong, U. / Ryu, D. Y. / Russell, T. P. / Hawker, C. J.

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Bang, J. / Jeong, U. / Ryu, D. Y. / Russell, T. P. / Hawker, C. J.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Contributors:

Bang, J. (author) / Jeong, U. (author) / Ryu, D. Y. (author) / Russell, T. P. (author) / Hawker, C. J. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 21 ; 4769-4792

Publication date:

2009-01-01

Size:

24 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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