Effect of RF Power on the Properties of Magnetron Sputtered ZnO:Al Thin Films Deposited at Room Temperature: Fid-Bau Portal

Effect of RF Power on the Properties of Magnetron Sputtered ZnO:Al Thin Films Deposited at Room Temperature

Selmi, M. / Chaabouni, F. / Abaab, M. / Rezig, B.

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Effect of RF Power on the Properties of Magnetron Sputtered ZnO:Al Thin Films Deposited at Room Temperature

Selmi, M. / Chaabouni, F. / Abaab, M. / Rezig, B.

Effect of RF Power on the Properties of Magnetron Sputtered ZnO:Al Thin Films Deposited at Room Temperature

Selmi, M. / Chaabouni, F. / Abaab, M. / Rezig, B.

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Document information

Title:

Effect of RF Power on the Properties of Magnetron Sputtered ZnO:Al Thin Films Deposited at Room Temperature

Contributors:

Selmi, M. (author) / Chaabouni, F. (author) / Abaab, M. (author) / Rezig, B. (author) / Rosa, L.G. / Margarido, F.

Published in:

Advanced Materials Forum V PART 2 ; 990-995

MATERIALS SCIENCE FORUM ; 636/637

Publication date:

2010-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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