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Inhomogeneous optoelectronic and microstructure property distribution across the substrate of ZnO:Al films deposited by room temperature magnetron sputtering
Inhomogeneous optoelectronic and microstructure property distribution across the substrate of ZnO:Al films deposited by room temperature magnetron sputtering
Inhomogeneous optoelectronic and microstructure property distribution across the substrate of ZnO:Al films deposited by room temperature magnetron sputtering
APPLIED SURFACE SCIENCE ; 257 ; 9773-9779
2011-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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