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Reactive Pulsed Laser Deposition of titanium nitride thin film: Optimization of process parameters using Secondary Ion Mass Spectrometry
Reactive Pulsed Laser Deposition of titanium nitride thin film: Optimization of process parameters using Secondary Ion Mass Spectrometry
Reactive Pulsed Laser Deposition of titanium nitride thin film: Optimization of process parameters using Secondary Ion Mass Spectrometry
Krishnan, R. (author) / Mathews, T. (author) / Balamurugan, A. K. (author) / Dash, S. (author) / Tyagi, A. K. (author) / Raj, B. (author) / Jayaram, V. (author)
APPLIED SURFACE SCIENCE ; 256 ; 3077-3080
2010-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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