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    Modeling of the long-range interstitial migration of ion implanted boron

    New search for: Velichko, O. I.
    New search for: Kniazhava, N. V.

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    Modeling of the long-range interstitial migration of ion implanted boron

    New search for: Velichko, O. I.
    New search for: Kniazhava, N. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Modeling of the long-range interstitial migration of ion implanted boron

    New search for: Velichko, O. I.
    New search for: Kniazhava, N. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Modeling of the long-range interstitial migration of ion implanted boron

    Contributors:

    Velichko, O. I. (author) / Kniazhava, N. V. (author)

    Published in:

    COMPUTATIONAL MATERIALS SCIENCE ; 48 ; 409-412

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    0927-0256

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1 / 510

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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