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    An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon

    New search for: Marcon, J.
    New search for: Ihaddadene-Le Coq, L.
    New search for: Masmoudi, K.
    New search for: Ketata, K.

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    An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon

    New search for: Marcon, J.
    New search for: Ihaddadene-Le Coq, L.
    New search for: Masmoudi, K.
    New search for: Ketata, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon

    New search for: Marcon, J.
    New search for: Ihaddadene-Le Coq, L.
    New search for: Masmoudi, K.
    New search for: Ketata, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
    Title:

    An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon

    Contributors:

    Marcon, J. (author) / Ihaddadene-Le Coq, L. (author) / Masmoudi, K. (author) / Ketata, K. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 415-418

    Publication date:

    2005-01-01

    Size:

    4 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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