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    Loading effect at etching of polypropylene films in oxygen-nitrogen plasma

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    Loading effect at etching of polypropylene films in oxygen-nitrogen plasma

    New search for: Kuvaldina, E. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Loading effect at etching of polypropylene films in oxygen-nitrogen plasma

    New search for: Kuvaldina, E. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Title:

    Loading effect at etching of polypropylene films in oxygen-nitrogen plasma

    Contributors:

    Kuvaldina, E. V. (author)

    Published in:

    SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY C/C OF ELEKTRONNAIA OBRABOTKA MATERIALOV ; 46 ; 138-143

    Publication date:

    2010-01-01

    Size:

    6 pages

    ISSN:

    1068-3755

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44 / 660.297

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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