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Etching of CVD diamond films using oxygen ions in ECR plasma

Ma, Z. / Wu, J. / Shen, W. / Yan, L. / Pan, X. / Wang, J.

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Etching of CVD diamond films using oxygen ions in ECR plasma

Ma, Z. / Wu, J. / Shen, W. / Yan, L. / Pan, X. / Wang, J.

Etching of CVD diamond films using oxygen ions in ECR plasma

Ma, Z. / Wu, J. / Shen, W. / Yan, L. / Pan, X. / Wang, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Etching of CVD diamond films using oxygen ions in ECR plasma

Contributors:

Ma, Z. (author) / Wu, J. (author) / Shen, W. (author) / Yan, L. (author) / Pan, X. (author) / Wang, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 289 ; 533-537

Publication date:

2014-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Kobashi, K. / Miyauchi, S. / Miyata, K. et al. | British Library Online Contents | 1996

On the post-etching of diamond thin films in hydrogen-oxygen atmosphere

Xiling, P. / Xiaolin, C. | British Library Online Contents | 1993

Loading effect at etching of polypropylene films in oxygen-nitrogen plasma

Kuvaldina, E. V. | British Library Online Contents | 2010

Additive oxygen effects in Cl~2 plasma etching of chrome films

Kwon, K.-H. / Kang, S.-Y. / Park, S.-H. et al. | British Library Online Contents | 1999

Anisotropic ECR Plasma Etching with Low-Energy Ions

Tobinaga, Y. / Miyano, T. / Fujimoto, K. et al. | British Library Online Contents | 1993