Additive oxygen effects in Cl~2 plasma etching of chrome films: Fid-Bau Portal

Additive oxygen effects in Cl~2 plasma etching of chrome films

Kwon, K.-H. / Kang, S.-Y. / Park, S.-H. / Sung, H.-K. / Kim, D.-K. / Moon, J.-H.

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Additive oxygen effects in Cl~2 plasma etching of chrome films

Kwon, K.-H. / Kang, S.-Y. / Park, S.-H. / Sung, H.-K. / Kim, D.-K. / Moon, J.-H.

Additive oxygen effects in Cl~2 plasma etching of chrome films

Kwon, K.-H. / Kang, S.-Y. / Park, S.-H. / Sung, H.-K. / Kim, D.-K. / Moon, J.-H.

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Document information

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Document information

Title:

Additive oxygen effects in Cl~2 plasma etching of chrome films

Contributors:

Kwon, K.-H. (author) / Kang, S.-Y. (author) / Park, S.-H. (author) / Sung, H.-K. (author) / Kim, D.-K. (author) / Moon, J.-H. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 18 ; 1197-1200

Publication date:

1999-01-01

Size:

4 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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