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Sputter-Deposited ZrO~2 Gate Dielectric on High Mobility Epitaxial-GaAs/Ge Channel Material for Advanced CMOS Applications
Sputter-Deposited ZrO~2 Gate Dielectric on High Mobility Epitaxial-GaAs/Ge Channel Material for Advanced CMOS Applications
Sputter-Deposited ZrO~2 Gate Dielectric on High Mobility Epitaxial-GaAs/Ge Channel Material for Advanced CMOS Applications
Dalapati, G.K. (author) / Kumar, A. (author) / Wong, A.S.W. (author) / Kumar, M.K. (author) / Chia, C.K. (author) / Ho, G.W. (author) / Chi, D.Z. (author) / Wang, J. / Mathew, P. / Li, X.
2010-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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