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    Nitrogen and Bias Effect on Homoepitaxial Diamond Growth by Hot-Filament Chemical Vapor Deposition

    New search for: Tsai, H.Y.
    New search for: Chang, C.C.
    New search for: Wu, C.W.
    New search for: Wang, J.
    New search for: Mathew, P.
    New search for: Li, X.
    New search for: Huang, C.
    New search for: Zhu, H.

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    Nitrogen and Bias Effect on Homoepitaxial Diamond Growth by Hot-Filament Chemical Vapor Deposition

    New search for: Tsai, H.Y.
    New search for: Chang, C.C.
    New search for: Wu, C.W.
    New search for: Wang, J.
    New search for: Mathew, P.
    New search for: Li, X.
    New search for: Huang, C.
    New search for: Zhu, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nitrogen and Bias Effect on Homoepitaxial Diamond Growth by Hot-Filament Chemical Vapor Deposition

    New search for: Tsai, H.Y.
    New search for: Chang, C.C.
    New search for: Wu, C.W.
    New search for: Wang, J.
    New search for: Mathew, P.
    New search for: Li, X.
    New search for: Huang, C.
    New search for: Zhu, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Nitrogen and Bias Effect on Homoepitaxial Diamond Growth by Hot-Filament Chemical Vapor Deposition

    Contributors:

    Tsai, H.Y. (author) / Chang, C.C. (author) / Wu, C.W. (author) / Wang, J. / Mathew, P. / Li, X. / Huang, C. / Zhu, H.

    Published in:

    Advances in Materials Processing IX ; 510-515

    KEY ENGINEERING MATERIALS ; 443

    Publication date:

    2010-01-01

    Size:

    6 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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