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    Influences of Film Thickness on the Electrical Properties of TaN~x Thin Films Deposited by Reactive DC Magnetron Sputtering

    New search for: Jiang, H.
    New search for: Wang, C.
    New search for: Zhang, W.
    New search for: Si, X.
    New search for: Li, Y.

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    Influences of Film Thickness on the Electrical Properties of TaN~x Thin Films Deposited by Reactive DC Magnetron Sputtering

    New search for: Jiang, H.
    New search for: Wang, C.
    New search for: Zhang, W.
    New search for: Si, X.
    New search for: Li, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influences of Film Thickness on the Electrical Properties of TaN~x Thin Films Deposited by Reactive DC Magnetron Sputtering

    New search for: Jiang, H.
    New search for: Wang, C.
    New search for: Zhang, W.
    New search for: Si, X.
    New search for: Li, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Influences of Film Thickness on the Electrical Properties of TaN~x Thin Films Deposited by Reactive DC Magnetron Sputtering

    Contributors:

    Jiang, H. (author) / Wang, C. (author) / Zhang, W. (author) / Si, X. (author) / Li, Y. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 26 ; 597-600

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    1005-0302

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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