A platform for research: civil engineering, architecture and urbanism
Microstresses in Molybdenum Nitride Thin Films Deposited by Reactive DC Magnetron Sputtering
Microstresses in Molybdenum Nitride Thin Films Deposited by Reactive DC Magnetron Sputtering
Microstresses in Molybdenum Nitride Thin Films Deposited by Reactive DC Magnetron Sputtering
Shen, Y. G. (author) / Denis, S. / Hanabusa, T. / He, B. / Mittemeijer, E. / Nan, J. / Noyan, I. C. / Scholtes, B. / Tanaka, K. / Xu, K.
2005-01-01
6 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
AlNxOy thin films deposited by DC reactive magnetron sputtering
British Library Online Contents | 2010
|Titanium Nitride - Silicon Nitride Composite Coatings Deposited by Reactive Magnetron Sputtering
British Library Online Contents | 1998
|British Library Online Contents | 2013
|Ti nitride phases in thin films deposited by DC magnetron sputtering
British Library Online Contents | 1996
|Field emission property of copper nitride thin film deposited by reactive magnetron sputtering
British Library Online Contents | 2008
|