Oxygen partial pressure dependence of the properties of MgZnO thin films during annealing: Fid-Bau Portal

Oxygen partial pressure dependence of the properties of MgZnO thin films during annealing

Liu, W. W. / Yao, B. / Li, Y. F. / Li, B. H. / Zhang, Z. Z. / Shan, C. X. / Zhang, J. Y. / Shen, D. Z. / Fan, X. W.

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Oxygen partial pressure dependence of the properties of MgZnO thin films during annealing

Liu, W. W. / Yao, B. / Li, Y. F. / Li, B. H. / Zhang, Z. Z. / Shan, C. X. / Zhang, J. Y. / Shen, D. Z. / Fan, X. W.

Oxygen partial pressure dependence of the properties of MgZnO thin films during annealing

Liu, W. W. / Yao, B. / Li, Y. F. / Li, B. H. / Zhang, Z. Z. / Shan, C. X. / Zhang, J. Y. / Shen, D. Z. / Fan, X. W.

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Title:

Oxygen partial pressure dependence of the properties of MgZnO thin films during annealing

Contributors:

Liu, W. W. (author) / Yao, B. (author) / Li, Y. F. (author) / Li, B. H. (author) / Zhang, Z. Z. (author) / Shan, C. X. (author) / Zhang, J. Y. (author) / Shen, D. Z. (author) / Fan, X. W. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 45 ; 6206-6211

Publication date:

2010-01-01

Size:

6 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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