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Thin film deposition using a plasma source with a hot refractory anode vacuum arc

Beilis, I. I. / Koulik, Y. / Boxman, R. L. / Arbilly, D.

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Thin film deposition using a plasma source with a hot refractory anode vacuum arc

Beilis, I. I. / Koulik, Y. / Boxman, R. L. / Arbilly, D.

Thin film deposition using a plasma source with a hot refractory anode vacuum arc

Beilis, I. I. / Koulik, Y. / Boxman, R. L. / Arbilly, D.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Thin film deposition using a plasma source with a hot refractory anode vacuum arc

Contributors:

Beilis, I. I. (author) / Koulik, Y. (author) / Boxman, R. L. (author) / Arbilly, D. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 45 ; 6325-6331

Publication date:

2010-01-01

Size:

7 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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