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    Photoelectrochemical etching to fabricate single-crystal SiC MEMS for harsh environments

    New search for: Zhao, F.
    New search for: Islam, M. M.
    New search for: Huang, C. F.

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    Photoelectrochemical etching to fabricate single-crystal SiC MEMS for harsh environments

    New search for: Zhao, F.
    New search for: Islam, M. M.
    New search for: Huang, C. F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Photoelectrochemical etching to fabricate single-crystal SiC MEMS for harsh environments

    New search for: Zhao, F.
    New search for: Islam, M. M.
    New search for: Huang, C. F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Photoelectrochemical etching to fabricate single-crystal SiC MEMS for harsh environments

    Contributors:

    Zhao, F. (author) / Islam, M. M. (author) / Huang, C. F. (author)

    Published in:

    MATERIALS LETTERS ; 65 ; 409-412

    Publication date:

    2011-01-01

    Size:

    4 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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