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    Effect of Substrate Temperature on the Properties of Al-Doped ZnO Films by RF Magnetron Sputtering

    New search for: Wu, Y.B.
    New search for: Lei, S.
    New search for: Wang, Z.
    New search for: Zhao, R.H.
    New search for: Huang, L.
    New search for: Li, H.
    New search for: Huang, Y.M.

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    Effect of Substrate Temperature on the Properties of Al-Doped ZnO Films by RF Magnetron Sputtering

    New search for: Wu, Y.B.
    New search for: Lei, S.
    New search for: Wang, Z.
    New search for: Zhao, R.H.
    New search for: Huang, L.
    New search for: Li, H.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of Substrate Temperature on the Properties of Al-Doped ZnO Films by RF Magnetron Sputtering

    New search for: Wu, Y.B.
    New search for: Lei, S.
    New search for: Wang, Z.
    New search for: Zhao, R.H.
    New search for: Huang, L.
    New search for: Li, H.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Title:

    Effect of Substrate Temperature on the Properties of Al-Doped ZnO Films by RF Magnetron Sputtering

    Contributors:

    Wu, Y.B. (author) / Lei, S. (author) / Wang, Z. (author) / Zhao, R.H. (author) / Huang, L. (author) / Li, H. (author) / Huang, Y.M.

    Published in:

    Optoelectronic Materials ; 1293-1297

    MATERIALS SCIENCE FORUM ; 663/665

    Publication date:

    2011-01-01

    Size:

    5 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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