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    Investigation on Preferential Chemical Etching of Dislocations in Sapphire

    New search for: Xie, X.J.
    New search for: Li, Y.Y.
    New search for: Wang, M.
    New search for: Liang, L.M.
    New search for: Hao, Q.Y.
    New search for: Liu, C.C.
    New search for: Huang, Y.M.

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    Investigation on Preferential Chemical Etching of Dislocations in Sapphire

    New search for: Xie, X.J.
    New search for: Li, Y.Y.
    New search for: Wang, M.
    New search for: Liang, L.M.
    New search for: Hao, Q.Y.
    New search for: Liu, C.C.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Investigation on Preferential Chemical Etching of Dislocations in Sapphire

    New search for: Xie, X.J.
    New search for: Li, Y.Y.
    New search for: Wang, M.
    New search for: Liang, L.M.
    New search for: Hao, Q.Y.
    New search for: Liu, C.C.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Investigation on Preferential Chemical Etching of Dislocations in Sapphire

    Contributors:

    Xie, X.J. (author) / Li, Y.Y. (author) / Wang, M. (author) / Liang, L.M. (author) / Hao, Q.Y. (author) / Liu, C.C. (author) / Huang, Y.M.

    Published in:

    Optoelectronic Materials ; 1318-1320

    MATERIALS SCIENCE FORUM ; 663/665

    Publication date:

    2011-01-01

    Size:

    3 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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