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Self assembled micro masking effect in the fabrication of SiC nanopillars by ICP-RIE dry etching
Self assembled micro masking effect in the fabrication of SiC nanopillars by ICP-RIE dry etching
Self assembled micro masking effect in the fabrication of SiC nanopillars by ICP-RIE dry etching
Kathalingam, A. (author) / Kim, M. R. (author) / Chae, Y. S. (author) / Sudhakar, S. (author) / Mahalingam, T. (author) / Rhee, J. K. (author)
APPLIED SURFACE SCIENCE ; 257 ; 3850-3855
2011-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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