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    Properties of a-Si:H films deposited by RF magnetron sputtering at 95^oC

    New search for: Girginoudi, D.
    New search for: Tsiarapas, C.
    New search for: Georgoulas, N.

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    Properties of a-Si:H films deposited by RF magnetron sputtering at 95^oC

    New search for: Girginoudi, D.
    New search for: Tsiarapas, C.
    New search for: Georgoulas, N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Properties of a-Si:H films deposited by RF magnetron sputtering at 95^oC

    New search for: Girginoudi, D.
    New search for: Tsiarapas, C.
    New search for: Georgoulas, N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Properties of a-Si:H films deposited by RF magnetron sputtering at 95^oC

    Contributors:

    Girginoudi, D. (author) / Tsiarapas, C. (author) / Georgoulas, N. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 3898-3903

    Publication date:

    2011-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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