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Atomic layer deposition of HfO~2 investigated in situ by means of a noncontact atomic force microscopy
Atomic layer deposition of HfO~2 investigated in situ by means of a noncontact atomic force microscopy
Atomic layer deposition of HfO~2 investigated in situ by means of a noncontact atomic force microscopy
Kolanek, K. (author) / Tallarida, M. (author) / Schmeisser, D. (author)
MATERIALS SCIENCE -WROCLAW- ; 28 ; 731-740
2010-01-01
10 pages
Article (Journal)
English
DDC:
620.11
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