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    Thermal stability and chemical bonding states of AlOxNy/Si gate stacks revealed by synchrotron radiation photoemission spectroscopy

    New search for: He, G.
    New search for: Toyoda, S.
    New search for: Shimogaki, Y.
    New search for: Oshima, M.

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    Thermal stability and chemical bonding states of AlOxNy/Si gate stacks revealed by synchrotron radiation photoemission spectroscopy

    New search for: He, G.
    New search for: Toyoda, S.
    New search for: Shimogaki, Y.
    New search for: Oshima, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thermal stability and chemical bonding states of AlOxNy/Si gate stacks revealed by synchrotron radiation photoemission spectroscopy

    New search for: He, G.
    New search for: Toyoda, S.
    New search for: Shimogaki, Y.
    New search for: Oshima, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Thermal stability and chemical bonding states of AlOxNy/Si gate stacks revealed by synchrotron radiation photoemission spectroscopy

    Contributors:

    He, G. (author) / Toyoda, S. (author) / Shimogaki, Y. (author) / Oshima, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 1638-1642

    Publication date:

    2010-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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