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    Soft X-ray photoemission study of nitrogen diffusion in TiN/HfO:N gate stacks

    New search for: Martinez, E.
    New search for: Gaumer, C.
    New search for: Lhostis, S.
    New search for: Licitra, C.
    New search for: Silly, M.
    New search for: Sirotti, F.
    New search for: Renault, O.

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    Soft X-ray photoemission study of nitrogen diffusion in TiN/HfO:N gate stacks

    New search for: Martinez, E.
    New search for: Gaumer, C.
    New search for: Lhostis, S.
    New search for: Licitra, C.
    New search for: Silly, M.
    New search for: Sirotti, F.
    New search for: Renault, O.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Soft X-ray photoemission study of nitrogen diffusion in TiN/HfO:N gate stacks

    New search for: Martinez, E.
    New search for: Gaumer, C.
    New search for: Lhostis, S.
    New search for: Licitra, C.
    New search for: Silly, M.
    New search for: Sirotti, F.
    New search for: Renault, O.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    Soft X-ray photoemission study of nitrogen diffusion in TiN/HfO:N gate stacks

    Contributors:

    Martinez, E. (author) / Gaumer, C. (author) / Lhostis, S. (author) / Licitra, C. (author) / Silly, M. (author) / Sirotti, F. (author) / Renault, O. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 2107-2112

    Publication date:

    2012-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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