Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Atomically Controlled Plasma Processing for Group IV Quantum Heterostructure Formation

    New search for: Sakuraba, M.
    New search for: Sugawara, K.
    New search for: Murota, J.
    New search for: Miyazaki, S.
    New search for: Tabata, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Atomically Controlled Plasma Processing for Group IV Quantum Heterostructure Formation

    New search for: Sakuraba, M.
    New search for: Sugawara, K.
    New search for: Murota, J.
    New search for: Miyazaki, S.
    New search for: Tabata, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atomically Controlled Plasma Processing for Group IV Quantum Heterostructure Formation

    New search for: Sakuraba, M.
    New search for: Sugawara, K.
    New search for: Murota, J.
    New search for: Miyazaki, S.
    New search for: Tabata, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Atomically Controlled Plasma Processing for Group IV Quantum Heterostructure Formation

    Contributors:

    Sakuraba, M. (author) / Sugawara, K. (author) / Murota, J. (author) / Miyazaki, S. / Tabata, H.

    Published in:

    Technology Evolution for Silicon Nano-Electronics ; 98-103

    KEY ENGINEERING MATERIALS ; 470

    Publication date:

    2011-01-01

    Size:

    6 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Ar plasma irradiation effects in atomically controlled Si epitaxial growth

    Muto, D. / Sakuraba, M. / Seino, T. et al. | British Library Online Contents | 2004

    Optical properties of atomically controlled InGaAs/InP quantum well structures

    Asahi, H. / Ijuin, E. / Kohara, T. et al. | British Library Online Contents | 1994

    Atomically controlled Ge epitaxial growth on Si(100) in Ar-plasma-enhanced GeH4 reaction

    Sugawara, K. / Sakuraba, M. / Murota, J. | British Library Online Contents | 2005

    Oxidation of spatially controlled atomically flat Si(001) surface

    Ando, A. / Sakamoto, K. / Miki, K. et al. | British Library Online Contents | 1998

    Atomically controlled surface and interface, and semiconductor device performance

    Sugano, T. | British Library Online Contents | 1992

    Back to top