An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide: Fid-Bau Portal

An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide

Huang, Y. / Tian, X. / Lv, S. / Yang, S. / Fu, R. K. / Chu, P. K. / Leng, J. / Li, Y.

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An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide

Huang, Y. / Tian, X. / Lv, S. / Yang, S. / Fu, R. K. / Chu, P. K. / Leng, J. / Li, Y.

An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide

Huang, Y. / Tian, X. / Lv, S. / Yang, S. / Fu, R. K. / Chu, P. K. / Leng, J. / Li, Y.

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Title:

An undercutting model of atomic oxygen for multilayer silica/alumina films fabricated by plasma immersion implantation and deposition on polyimide

Contributors:

Huang, Y. (author) / Tian, X. (author) / Lv, S. (author) / Yang, S. (author) / Fu, R. K. (author) / Chu, P. K. (author) / Leng, J. (author) / Li, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 9158-9163

Publication date:

2011-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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