Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances: Fid-Bau Portal

Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

Pan, G. / Gu, Z. / Zhou, Y. / Li, T. / Gong, H. / Liu, Y.

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Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

Pan, G. / Gu, Z. / Zhou, Y. / Li, T. / Gong, H. / Liu, Y.

Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

Pan, G. / Gu, Z. / Zhou, Y. / Li, T. / Gong, H. / Liu, Y.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

Contributors:

Pan, G. (author) / Gu, Z. (author) / Zhou, Y. (author) / Li, T. (author) / Gong, H. (author) / Liu, Y. (author)

Published in:

WEAR -LAUSANNE- ; 273 ; 100-104

Publication date:

2011-01-01

Size:

5 pages

ISSN:

0043-1648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11292

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