Stability of La2O3 and GeO2 passivated Ge surfaces during ALD of ZrO2 high-k dielectric: Fid-Bau Portal

Stability of La2O3 and GeO2 passivated Ge surfaces during ALD of ZrO2 high-k dielectric

Bethge, O. / Henkel, C. / Abermann, S. / Pozzovivo, G. / Stoeger-Pollach, M. / Werner, W. S. / Smoliner, J. / Bertagnolli, E.

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Stability of La2O3 and GeO2 passivated Ge surfaces during ALD of ZrO2 high-k dielectric

Bethge, O. / Henkel, C. / Abermann, S. / Pozzovivo, G. / Stoeger-Pollach, M. / Werner, W. S. / Smoliner, J. / Bertagnolli, E.

Stability of La2O3 and GeO2 passivated Ge surfaces during ALD of ZrO2 high-k dielectric

Bethge, O. / Henkel, C. / Abermann, S. / Pozzovivo, G. / Stoeger-Pollach, M. / Werner, W. S. / Smoliner, J. / Bertagnolli, E.

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Document information

Title:

Stability of La2O3 and GeO2 passivated Ge surfaces during ALD of ZrO2 high-k dielectric

Contributors:

Bethge, O. (author) / Henkel, C. (author) / Abermann, S. (author) / Pozzovivo, G. (author) / Stoeger-Pollach, M. (author) / Werner, W. S. (author) / Smoliner, J. (author) / Bertagnolli, E. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 3444-3449

Publication date:

2012-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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