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Stabilization of a very high-k crystalline ZrO2 phase by post deposition annealing of atomic layer deposited ZrO2/La2O3 dielectrics on germanium
Stabilization of a very high-k crystalline ZrO2 phase by post deposition annealing of atomic layer deposited ZrO2/La2O3 dielectrics on germanium
Stabilization of a very high-k crystalline ZrO2 phase by post deposition annealing of atomic layer deposited ZrO2/La2O3 dielectrics on germanium
Abermann, S. (author) / Henkel, C. (author) / Bethge, O. (author) / Pozzovivo, G. (author) / Klang, P. (author) / Bertagnolli, E. (author)
APPLIED SURFACE SCIENCE ; 256 ; 5031-5034
2010-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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