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    In situ X-ray photoelectron spectroscopy characterization of Al2O3/InSb interface evolution from atomic layer deposition

    New search for: Zhernokletov, D. M.
    New search for: Dong, H.
    New search for: Brennan, B.
    New search for: Kim, J.
    New search for: Wallace, R. M.

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    In situ X-ray photoelectron spectroscopy characterization of Al2O3/InSb interface evolution from atomic layer deposition

    New search for: Zhernokletov, D. M.
    New search for: Dong, H.
    New search for: Brennan, B.
    New search for: Kim, J.
    New search for: Wallace, R. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    In situ X-ray photoelectron spectroscopy characterization of Al2O3/InSb interface evolution from atomic layer deposition

    New search for: Zhernokletov, D. M.
    New search for: Dong, H.
    New search for: Brennan, B.
    New search for: Kim, J.
    New search for: Wallace, R. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    In situ X-ray photoelectron spectroscopy characterization of Al2O3/InSb interface evolution from atomic layer deposition

    Contributors:

    Zhernokletov, D. M. (author) / Dong, H. (author) / Brennan, B. (author) / Kim, J. (author) / Wallace, R. M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 5522-5525

    Publication date:

    2012-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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