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    Thick film patterning by lift-off process using double-coated single photoresists

    New search for: Fu, Y.
    New search for: Ye, L. L.
    New search for: Liu, J.

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    Thick film patterning by lift-off process using double-coated single photoresists

    New search for: Fu, Y.
    New search for: Ye, L. L.
    New search for: Liu, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thick film patterning by lift-off process using double-coated single photoresists

    New search for: Fu, Y.
    New search for: Ye, L. L.
    New search for: Liu, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Thick film patterning by lift-off process using double-coated single photoresists

    Contributors:

    Fu, Y. (author) / Ye, L. L. (author) / Liu, J. (author)

    Published in:

    MATERIALS LETTERS ; 76 ; 117-119

    Publication date:

    2012-01-01

    Size:

    3 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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