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    Boron-Doped Nanocrystalline Silicon Thin Films Prepared by PECVD

    New search for: Wang, X.Q.
    New search for: Ding, J.N.
    New search for: Yuan, N.Y.
    New search for: Wang, S.B.
    New search for: Wang, X.

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    Boron-Doped Nanocrystalline Silicon Thin Films Prepared by PECVD

    New search for: Wang, X.Q.
    New search for: Ding, J.N.
    New search for: Yuan, N.Y.
    New search for: Wang, S.B.
    New search for: Wang, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Boron-Doped Nanocrystalline Silicon Thin Films Prepared by PECVD

    New search for: Wang, X.Q.
    New search for: Ding, J.N.
    New search for: Yuan, N.Y.
    New search for: Wang, S.B.
    New search for: Wang, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Boron-Doped Nanocrystalline Silicon Thin Films Prepared by PECVD

    Contributors:

    Wang, X.Q. (author) / Ding, J.N. (author) / Yuan, N.Y. (author) / Wang, S.B. (author) / Wang, X.

    Published in:

    Micro-Nano Technology XIII Selected, peer reviewed papers from the 13th Annual Conference of Chinese Society of Micro-Nano Technology, September 28-30, 2011, Changchow, China ; 386-392

    KEY ENGINEERING MATERIALS ; 503

    Publication date:

    2012-01-01

    Size:

    7 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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