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Non-equilibrium, Atmospheric-pressure Plasma Jet for Depositing Silicon Oxide Films

Lin, J. / Zhang, X.-w. / Han, G.-r.

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Non-equilibrium, Atmospheric-pressure Plasma Jet for Depositing Silicon Oxide Films

Lin, J. / Zhang, X.-w. / Han, G.-r.

Non-equilibrium, Atmospheric-pressure Plasma Jet for Depositing Silicon Oxide Films

Lin, J. / Zhang, X.-w. / Han, G.-r.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

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Document information

Title:

Non-equilibrium, Atmospheric-pressure Plasma Jet for Depositing Silicon Oxide Films

Contributors:

Lin, J. (author) / Zhang, X.-w. (author) / Han, G.-r. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 30 ; 241-244

Publication date:

2012-01-01

Size:

4 pages

ISSN:

1673-2812

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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