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Non-equilibrium, Atmospheric-pressure Plasma Jet for Depositing Silicon Oxide Films
Non-equilibrium, Atmospheric-pressure Plasma Jet for Depositing Silicon Oxide Films
Non-equilibrium, Atmospheric-pressure Plasma Jet for Depositing Silicon Oxide Films
Lin, J. (author) / Zhang, X.-w. (author) / Han, G.-r. (author)
MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 30 ; 241-244
2012-01-01
4 pages
Article (Journal)
Unknown
DDC:
620.11
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