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High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications
High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications
High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications
Gu, X. (author) / Dorsey, P. (author) / Russell, T. P. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; 5505-5511
2012-01-01
7 pages
Article (Journal)
English
DDC:
620.11
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